Surface reactions in Ni MOCVD using cyclopentadienylallylnickel as a precursor

Autor: Ishikawa, Masato *, Kada, Takeshi, Machida, Hideaki, Soai, Kensou, Ogura, Atsushi, Ohshita, Yoshio
Zdroj: In Journal of Crystal Growth 2005 275(1):e1121-e1125
Databáze: ScienceDirect