Volatile CVD precursor for Ni film: cyclopentadienylallylnickel

Autor: Kada, T. *, Ishikawa, M., Machida, H., Ogura, A., Ohshita, Y., Soai, K.
Zdroj: In Journal of Crystal Growth 2005 275(1):e1115-e1119
Databáze: ScienceDirect