Indium-facilitated growth and characterization of N-polar GaN by RF plasma-assisted molecular beam epitaxy

Autor: Huang, J.H. *, Hsieh, K.Y., Tsai, J.K., Huang, H.L., Hsieh, C.H., Lee, Y.C., Chuang, K.L., Lo, Ikai, Tu, L.W.
Zdroj: In Journal of Crystal Growth 1 March 2004 263(1-4):301-307
Databáze: ScienceDirect