Effect of phosphorus doping on the structural properties in nc-Si:H thin films

Autor: Gullanar, M.H., Zhang, Y.H., Chen, H., Wei, W.S., Xu, G.Y., Wang, T.M., Cui, R.Q., Shen, W.Z. *
Zdroj: In Journal of Crystal Growth 2003 256(3):254-260
Databáze: ScienceDirect