Effect of phosphorus doping on the structural properties in nc-Si:H thin films
Autor: | Gullanar, M.H., Zhang, Y.H., Chen, H., Wei, W.S., Xu, G.Y., Wang, T.M., Cui, R.Q., Shen, W.Z. * |
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Zdroj: | In Journal of Crystal Growth 2003 256(3):254-260 |
Databáze: | ScienceDirect |
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