Surface morphology investigation of Si thin film grown by temperature modulation Si molecular-layer epitaxy
| Autor: | Nishizawa, J *, Murai, A, Oizumi, T, Kurabayashi, T, Kanamoto, K, Yoshida, T |
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| Zdroj: | In Journal of Crystal Growth 2001 226(1):39-46 |
| Databáze: | ScienceDirect |
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