A chemical assessment of the suitability of allyl- iso-propyltelluride as a Te precursor for metal organic vapour phase epitaxy

Autor: Hails, Janet E. a, *, Cole-Hamilton, David J. b, Stevenson, John b, Bell, William b, Foster, Douglas F. b, Ellis, David b
Zdroj: In Journal of Crystal Growth 2001 224(1):21-31
Databáze: ScienceDirect