A chemical assessment of the suitability of allyl- iso-propyltelluride as a Te precursor for metal organic vapour phase epitaxy
Autor: | Hails, Janet E. a, *, Cole-Hamilton, David J. b, Stevenson, John b, Bell, William b, Foster, Douglas F. b, Ellis, David b |
---|---|
Zdroj: | In Journal of Crystal Growth 2001 224(1):21-31 |
Databáze: | ScienceDirect |
Externí odkaz: |