Numerical modeling of silicon oxide particle formation and transport in a one-dimensional low-pressure chemical vapor deposition reactor
| Autor: | Suh, S.-M., Zachariah, M.R., Girshick, S.L. * |
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| Zdroj: | In Journal of Aerosol Science 2002 33(6):943-959 |
| Databáze: | ScienceDirect |
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