Numerical modeling of silicon oxide particle formation and transport in a one-dimensional low-pressure chemical vapor deposition reactor
Autor: | Suh, S.-M., Zachariah, M.R., Girshick, S.L. * |
---|---|
Zdroj: | In Journal of Aerosol Science 2002 33(6):943-959 |
Databáze: | ScienceDirect |
Externí odkaz: |