Interfacial thermal resistance between mechanically exfoliated nm-thick MoS2 and silicon from −60 °C to 50 °C based on ns-ET Raman technique
| Autor: | Li, Cichun, Peng, Jinhao, Ou, Jiayi, Wang, Tianyu, Xie, Yangsu |
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| Zdroj: | In International Journal of Heat and Mass Transfer 1 September 2024 229 |
| Databáze: | ScienceDirect |
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