High patterning photosensitivity by a novel fluorinated copolymer formulated resist
| Autor: | Guo, Yana, Li, Shenshen, Wang, Haihua, Chen, Yu, Chen, Huan, Wang, Dong, Wang, Qianqian, Kang, Wenbing |
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| Zdroj: | In European Polymer Journal 15 May 2024 211 |
| Databáze: | ScienceDirect |
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