One-component chemically amplified resist composed of polymeric sulfonium salt PAGs for high resolution patterning
| Autor: | Wang, Qianqian, Zhang, Chenying, Yan, Chenfeng, You, Fengjuan, Wang, Liyuan |
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| Zdroj: | In European Polymer Journal May 2019 114:11-18 |
| Databáze: | ScienceDirect |
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