Electrodeposition of bismuth, tellurium and bismuth telluride through sub-10 nm mesoporous silica thin films
| Autor: | Shao, Li, Zhelev, Nikolay, Zhang, Wenjian, Reid, Gillian, Huang, Ruomeng, Bartlett, Philip N., Hector, Andrew L. |
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| Zdroj: | In Electrochimica Acta 20 November 2024 505 |
| Databáze: | ScienceDirect |
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