Corrosion mechanism in PVD deposited nano-scale titanium nitride thin film with intercalated titanium for protecting the surface of silicon

Autor: Chaudhry, A.U., Mansoor, Bilal, Mungole, Tarang, Ayoub, Georges, Field, David P.
Zdroj: In Electrochimica Acta 20 February 2018 264:69-82
Databáze: ScienceDirect