Metal seed layer sputtering on high aspect ratio through-silicon-vias for copper filling electroplating

Autor: Song, Young Sik, Yim, TaiHong, Park, Soo-Keun, Lee, Jae-Ho, Kim, Jongryoul
Zdroj: In Electrochimica Acta 30 December 2013 114:832-837
Databáze: ScienceDirect