Formation and characterization of low resistivity sub-100 nm copper films deposited by electroless on SAM
| Autor: | Asher, T., Inberg, A., Glickman, E., Fishelson, N., Shacham-Diamand, Y. |
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| Zdroj: | In Electrochimica Acta 2009 54(25):6053-6057 |
| Databáze: | ScienceDirect |
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