Improvement of the electrochemical behaviour of AlN films produced by reactive sputtering using various under-layers
| Autor: | Vacandio, F, Massiani, Y *, Gravier, P, Rossi, S, Bonora, P.L, Fedrizzi, L |
|---|---|
| Zdroj: | In Electrochimica Acta 2001 46(24):3827-3834 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect