Controlled corrosion behaviors of copper in oxidizer solutions for chemical mechanical polishing: Influence of the decomposition products
| Autor: | Chang, Pengfei, Huang, Zisheng, Chen, Yulong, Ling, Huiqin, Wu, Yunwen, Li, Ming, Hang, Tao ⁎ |
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| Zdroj: | In Corrosion Science September 2024 238 |
| Databáze: | ScienceDirect |
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