High temperature oxidation resistance of physical vapor deposited Hf-Si-B2±z thin films
| Autor: | Glechner, T., Bahr, A., Hahn, R., Wojcik, T., Heller, M., Kirnbauer, A., Ramm, J., Kolozsvari, S., Felfer, P., Riedl, H. |
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| Zdroj: | In Corrosion Science 15 August 2022 205 |
| Databáze: | ScienceDirect |
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