Screening of electroplating additive for improving throwing power of copper pyrophosphate bath via molecular dynamics simulation

Autor: Li, Qingyang, Hu, Jiaping, Zhang, Jinqiu, Yang, Peixia, Hu, Yidong, An, Maozhong
Zdroj: In Chemical Physics Letters 16 October 2020 757
Databáze: ScienceDirect