Stationary and non-stationary etching of Si(100) surfaces with gas phase and adsorbed hydrogen
Autor: | Dinger, A a, Lutterloh, C a, Küppers, J a, b, * |
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Zdroj: | In Chemical Physics Letters 2000 320(5):405-410 |
Databáze: | ScienceDirect |
Externí odkaz: |