A revisit from CVD kinetics to CVD reactor: Investigating uniform growth mechanism of polysilicon in a reduction furnace
Autor: | Si, Wei, Wang, Ning, Zong, Yuan, Dai, Gance, Meng, Fanzheng, Yang, Zuodong, Zhao, Ling, Xin, Zhong, Jiang, Guangjing |
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Zdroj: | In Chemical Engineering Science 5 August 2024 295 |
Databáze: | ScienceDirect |
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