A revisit from CVD kinetics to CVD reactor: Investigating uniform growth mechanism of polysilicon in a reduction furnace

Autor: Si, Wei, Wang, Ning, Zong, Yuan, Dai, Gance, Meng, Fanzheng, Yang, Zuodong, Zhao, Ling, Xin, Zhong, Jiang, Guangjing
Zdroj: In Chemical Engineering Science 5 August 2024 295
Databáze: ScienceDirect