Bonding structure and dry etching characteristics in amorphous B–C–N films for hardmask applications
| Autor: | Kim, Hongik, Kim, Unggi, Hong, Deokgi, Kim, Sungtae, Han, Seungwu, Joo, Young-Chang, Lee, So-Yeon |
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| Zdroj: | In Carbon June 2024 226 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect