Bonding structure and etching characteristics of amorphous carbon for a hardmask deposited by DC sputtering
| Autor: | Lee, So-Yeon, Jang, Kyung-Tae, Jeong, Min-Woo, Kim, Sungtae, Park, Hwanyeol, Kim, Kuntae, Lee, Gun-Do, Kim, Miyoung, Joo, Young-Chang |
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| Zdroj: | In Carbon December 2019 154:277-284 |
| Databáze: | ScienceDirect |
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