Effects of the temperature and beam parameters on depth profiles in X-ray photoelectron spectrometry and secondary ion mass spectrometry under C60+–Ar+ cosputtering

Autor: Liao, Hua-Yang, Tsai, Meng-Hung, Kao, Wei-Lun, Kuo, Ding-Yuan, Shyue, Jing-Jong
Zdroj: In Analytica Chimica Acta 10 December 2014 852:129-136
Databáze: ScienceDirect