Copper Passivity in Carbonate Base Solutions and its Application in Chemical Mechanical Planarization (CMP)
| Autor: | Abelev, E., Starosvetsky, D., Auinat, M., Ein-Eli, Y. |
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| Zdroj: | In Passivation of Metals and Semiconductors, and Properties of Thin Oxide Layers 2006:125-130 |
| Databáze: | ScienceDirect |
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