Ion-implanted capacitively coupled silicon strip detectors with integrated polysilicon bias resistors processed on a 100 mm wafer

Autor: Hietanen, Iiro, Lindgren, Jukka, Orava, Risto, Tuuva, Tuure, Voutilainen, Martti, Brenner, Richard, Andersson, Mikael, Leinonen, Kari, Ronkainen, Hannu
Zdroj: In Nuclear Inst. and Methods in Physics Research, A 1991 310(3):671-676
Databáze: ScienceDirect