Investigation of etching Al and AlSi x in the discharge of Cl-containing gases : A P Avtjushkov, G I Melyanets and A F Stekolnikov, Minsk Radioengineering Institute, P Brovka st 6, Minsk, 220069, USSR

Zdroj: In Vacuum 1988 38(8):949-949
Databáze: ScienceDirect
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