Application of high-intensity vacuum ultraviolet light for amorphous silicon film fabrication using a windowless photochemical vapor deposition system
| Autor: | Ueno, Tomo, Sawado, Yoshinori, Akiyama, Takeshi, Iwasaki, Yoshitaka, Kuroiwa, Koichi, Tarui, Yasuo |
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| Zdroj: | In Journal of Non-Crystalline Solids 1994 169(3):283-287 |
| Databáze: | ScienceDirect |
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