Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al2O3 and its application in imprinting lithography

Autor: Hyojeong Kim, Kristin Arbutina, Anqin Xu, Haitao Liu
Jazyk: angličtina
Rok vydání: 2017
Předmět:
Zdroj: Beilstein Journal of Nanotechnology, Vol 8, Iss 1, Pp 2363-2375 (2017)
Druh dokumentu: article
ISSN: 2190-4286
DOI: 10.3762/bjnano.8.236
Popis: We present a method to increase the stability of DNA nanostructure templates through conformal coating with a nanometer-thin protective inorganic oxide layer created using atomic layer deposition (ALD). DNA nanotubes and origami triangles were coated with ca. 2 nm to ca. 20 nm of Al2O3. Nanoscale features of the DNA nanostructures were preserved after the ALD coating and the patterns are resistive to UV/O3 oxidation. The ALD-coated DNA templates were used for a direct pattern transfer to poly(L-lactic acid) films.
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