Recent Advances in Aluminum Nitride (AlN) Growth by Magnetron Sputtering Techniques and Its Applications

Autor: Nabeel Ahmad Khan Jadoon, Vaigunthan Puvanenthiram, Mayada Ahmed Hassan Mosa, Ashutosh Sharma, Kaiying Wang
Jazyk: angličtina
Rok vydání: 2024
Předmět:
Zdroj: Inorganics, Vol 12, Iss 10, p 264 (2024)
Druh dokumentu: article
ISSN: 2304-6740
DOI: 10.3390/inorganics12100264
Popis: This review explores the processes involved in enhancing AlN film quality through various magnetron sputtering techniques, crucial for optimizing performance and expanding their application scope. It presents recent advancements in growing AlN thin films via magnetron sputtering, elucidating the mechanisms of AlN growth and navigating the complexities of thin-film fabrication. Emphasis is placed on different sputtering methods such as DC, RF, pulsed DC, and high-power impulse DC, highlighting how tailored sputtering conditions enhance film characteristics in each method. Additionally, the review discusses recent research findings showcasing the dynamic potential of these techniques. The practical applications of AlN thin films, including wave resonators, energy harvesting devices, and thermal management solutions, are outlined, demonstrating their relevance in addressing real-world engineering challenges.
Databáze: Directory of Open Access Journals
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