New approaches for achieving more perfect transition metal oxide thin films

Autor: J. L. MacManus-Driscoll, Matthew P. Wells, Chao Yun, Jung-Woo Lee, Chang-Beom Eom, Darrell G. Schlom
Jazyk: angličtina
Rok vydání: 2020
Předmět:
Zdroj: APL Materials, Vol 8, Iss 4, Pp 040904-040904-13 (2020)
Druh dokumentu: article
ISSN: 2166-532X
DOI: 10.1063/5.0003268
Popis: This perspective considers the enormous promise of epitaxial functional transition metal oxide thin films for future applications in low power electronic and energy applications since they offer wide-ranging and highly tunable functionalities and multifunctionalities, unrivaled among other classes of materials. It also considers the great challenges that must be overcome for transition metal oxide thin films to meet what is needed in the application domain. These challenges arise from the presence of intrinsic defects and strain effects, which lead to extrinsic defects. Current conventional thin film deposition routes often cannot deliver the required perfection and performance. Since there is a strong link between the physical properties, defects and strain, routes to achieving more perfect materials need to be studied. Several emerging methods and modifications of current methods are presented and discussed. The reasons these methods better address the perfection challenge are considered and evaluated.
Databáze: Directory of Open Access Journals