Strained Silicon Single Nanowire Gate-All-Around TFETs with Optimized Tunneling Junctions

Autor: Keyvan Narimani, Stefan Trellenkamp, Andreas Tiedemann, Siegfried Mantl, Qing-Tai Zhao
Jazyk: angličtina
Rok vydání: 2018
Předmět:
Zdroj: Applied Sciences, Vol 8, Iss 5, p 670 (2018)
Druh dokumentu: article
ISSN: 2076-3417
DOI: 10.3390/app8050670
Popis: In this work, we demonstrate a strained Si single nanowire tunnel field effect transistor (TFET) with gate-all-around (GAA) structure yielding Ion-current of 15 μA/μm at the supply voltage of Vdd = 0.5V with linear onset at low drain voltages. The subthreshold swing (SS) at room temperature shows an average of 76 mV/dec over 4 orders of drain current Id from 5 × 10−6 to 5 × 10−2 µA/µm Optimized devices also show excellent current saturation, an important feature for analog performance.
Databáze: Directory of Open Access Journals