| Autor: |
Ahmed A. M. El-Amir, Takeo Ohsawa, Satoshi Ishii, Masataka Imura, Hiroyo Segawa, Isao Sakaguchi, Tadaaki Nagao, Kiyoshi Shimamura, Naoki Ohashi |
| Jazyk: |
angličtina |
| Rok vydání: |
2019 |
| Předmět: |
|
| Zdroj: |
AIP Advances, Vol 9, Iss 5, Pp 055024-055024-5 (2019) |
| Druh dokumentu: |
article |
| ISSN: |
2158-3226 |
| DOI: |
10.1063/1.5091661 |
| Popis: |
For the full benefit of the silicon chip industry and to further shift the photoresponse cut-off wavelength of the silicon photodetectors, high-performance Ag-doped Si p-n photodiodes with an extended infrared photoresponsivity are constructed on the bulk silicon wafer by a facile thermal diffusion process at 550 °C for different annealing periods of 5, 10, and 15 minutes under an argon atmosphere. These Si-compatible p-n photodiodes revealed an obvious zero-bias room temperature photoresponsivity with a threshold photon energy at a longer wavelength compared to the photoresponsivity cut-off wavelength of the commercial Si photodiode of the Hamamatsu Photonics Co (model: S2281/-04). The photoresponsivity has decreased with the annealing time increase however; the detectivity has been improved by the significant drop in leakage current and noise power. The outcomes indicate that this study paves the way for developing cost-effective Si-compatible p-n junction photodiodes, with an obvious zero-biased room-temperature photoresponsivity of a comparable intensity and longer cut-off wavelength compared to the commercial Hamamatsu Si photodiode. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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