Effect of annealing conditions on surface morphology and ferroelectric domain structures of BiFeO3 thin films
| Autor: | Minchuan Liang, Jia Yang, Huayu Yang, Chen Liang, Zhenyue Nie, Hui Ai, Tong Zhang, Ji Ma, Houbing Huang, Jing Wang |
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| Jazyk: | angličtina |
| Rok vydání: | 2024 |
| Předmět: | |
| Zdroj: | Journal of Advanced Dielectrics, Vol 14, Iss 02 (2024) |
| Druh dokumentu: | article |
| ISSN: | 2010135X 2010-1368 2010-135X |
| DOI: | 10.1142/S2010135X24400022 |
| Popis: | Ferroelectric materials are widely used in the applications of electronic devices due to their robust spontaneous polarization. The surface roughness of ferroelectric thin films, which is closely related to the morphology, can play an important role in determining the ferroelectric domain structures. In this work, we have investigated the influence of annealing conditions on the surface morphology of epitaxial BiFeO3 and SrRuO3 thin films prepared by pulsed laser deposition on SrTiO3 (001) substrates. It is found that the morphology of the thin films is sensitive to the annealing time and cooling rate, and the corresponding surface roughness decreases with increasing annealing time and decreasing cooling rate. In addition, the ferroelectric domain structures of BiFeO3 films have been investigated by piezoelectric force microscopy, which shows a significant improvement in domain size and reverse piezoelectric response in the thin films with decreasing surface roughness. This work provides a simple way to predict and improve the ferroelectric domain structures by in situ annealing. |
| Databáze: | Directory of Open Access Journals |
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