High-power and efficiency W-band InAlGaN/AlN/GaN high-electron-mobility transistors for future high-capacity wireless communications

Autor: Yusuke Kumazaki, Shiro Ozaki, Yasuhiro Nakasha, Naoya Okamoto, Atsushi Yamada, Toshihiro Ohki
Jazyk: angličtina
Rok vydání: 2024
Předmět:
Zdroj: Applied Physics Express, Vol 17, Iss 8, p 086504 (2024)
Druh dokumentu: article
ISSN: 1882-0786
DOI: 10.35848/1882-0786/ad68c2
Popis: This study describes high-power and high-efficiency W-band InAlGaN/AlN/GaN high-electron-mobility transistors (HEMTs) for future sub-terahertz wireless communications. A low-thermal-budget selective-area growth (SAG) process was developed to obtain low contact resistance with low trap states. Transmission lines and substrate structures were optimized to obtain high-thermal conductivity and low substrate resonance. Consequently, a high output power of 28.7 dBm (742 mW), output power density of 4.6 W mm ^−1 , and power-added efficiency (PAE) of 28.0% were achieved with pre-matched InAlGaN/AlN/GaN HEMTs at 90 GHz, which were superior combination of output power and PAE compared to the conventional high-temperature SAG process.
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