Mastering the Art of High Mobility Material Integration on Si: A Path towards Power-Efficient CMOS and Functional Scaling

Autor: Nadine Collaert
Jazyk: angličtina
Rok vydání: 2016
Předmět:
Zdroj: Journal of Low Power Electronics and Applications, Vol 6, Iss 2, p 9 (2016)
Druh dokumentu: article
ISSN: 2079-9268
DOI: 10.3390/jlpea6020009
Popis: In this work, we will review the current progress in integration and device design of high mobility devices. With main focus on (Si)Ge for PMOS and In(Ga)As for NMOS, the benefits and challenges of integrating these materials on a Si platform will be discussed for both density scaling (“more Moore”) and functional scaling to enhance on-chip functionality (“more than Moore”).
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