Influence of Film Coating Thickness on Secondary Electron Emission Characteristics of Non-Evaporable Getter Ti-Hf-V-Zr Coated Open-Cell Copper Foam Substrates

Autor: Jing Zhang, Jie Wang, Yong Gao, Yaocheng Hu, Yupeng Xie, Zhiming You, Sheng Wang
Jazyk: angličtina
Rok vydání: 2022
Předmět:
Zdroj: Materials, Vol 15, Iss 6, p 2185 (2022)
Druh dokumentu: article
ISSN: 1996-1944
DOI: 10.3390/ma15062185
Popis: The application of vacuum materials with low secondary electron yield (SEY) is one of the effective methods to mitigate the electron cloud (EC). In this study, the Ti-Hf-V-Zr non-evaporable getter (NEG) film was deposited on open-cell copper foams with different pore sizes for the suppression of electron multipacting effects. Besides, the influence of the film thickness on the secondary electron emission (SEE) characteristics of Ti-Hf-V-Zr NEG film-coated open-cell copper foam substrates was investigated for the first time. The results highlighted that all uncoated and NEG-coated foamed porous copper substrates achieved a low SEY (
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