Polarized holographic lithography system for high-uniformity microscale patterning with periodic tunability

Autor: Gaopeng Xue, Qihang Zhai, Haiou Lu, Qian Zhou, Kai Ni, Liyu Lin, Xiaohao Wang, Xinghui Li
Jazyk: angličtina
Rok vydání: 2021
Předmět:
Zdroj: Microsystems & Nanoengineering, Vol 7, Iss 1, Pp 1-10 (2021)
Druh dokumentu: article
ISSN: 2055-7434
DOI: 10.1038/s41378-021-00256-z
Popis: Abstract Periodic microscale array structures play an important role in diverse applications involving photonic crystals and diffraction gratings. A polarized holographic lithography system is proposed for patterning high-uniformity microscale two-dimensional crossed-grating structures with periodic tunability. Orthogonal two-axis Lloyd’s mirror interference and polarization modulation produce three sub-beams, enabling the formation of two-dimensional crossed-grating patterns with wavelength-comparable periods by a single exposure. The two-dimensional-pattern period can also be flexibly tuned by adjusting the interferometer spatial positioning. Polarization states of three sub-beams, defining the uniformity of the interference fringes, are modulated at their initial-polarization states based on a strict full polarization tracing model in a three-dimensional space. A polarization modulation model is established considering two conditions of eliminating the unexpected interference and providing the desired identical interference intensities. The proposed system is a promising approach for fabricating high-uniformity two-dimensional crossed gratings with a relatively large grating period range of 500–1500 nm. Moreover, our rapid and stable approach for patterning period-tunable two-dimensional-array microstructures with high uniformity could be applicable to other multibeam interference lithography techniques.
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