Preparation and Characterization of High Quality SnO2 Films Grown by (HPCVD)
| Autor: | Baha T. Chiad, Nathera Ali, Nagam Th.Ali |
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| Jazyk: | angličtina |
| Rok vydání: | 2014 |
| Předmět: | |
| Zdroj: | Engineering and Technology Journal, Vol 32, Iss 4B, Pp 801-810 (2014) |
| Druh dokumentu: | article |
| ISSN: | 1681-6900 2412-0758 |
| DOI: | 10.30684/etj.32.4B.20 |
| Popis: | In this research SnO2 thin films have been prepared by using hot plate atmospheric pressure chemical vapor deposition (HPCVD) on glass and Si (n-type) substrates at various temperatures. Optical properties have been measured by UV-VIS spectrophotometer, maximum transmittance about (94%) at 400 0C. Structure properties have been studied by using X-ray diffraction (XRD) , its shows that all films have a crystalline structure in nature and by increasing growth temperature from(350-500) 0C diffraction peaks becomes sharper and grain size has been change. Atomic force microscopy (AFM) uses to analyze the morphology of the Tine Oxides surface structure. Roughness & Root mean square for different temperature have been investigated. The results show that both increase with substrate temperature increase this measurements deal with X-Ray diffraction results, that there is large change in the structure state of SnO2 thin f film by changing temperature parameter. |
| Databáze: | Directory of Open Access Journals |
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