The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films

Autor:	Leonardo Velasco Estrada, Jhon Jairo Olaya Florez, Rodolfo Rodríguez Baracaldo
Jazyk:	angličtina
Rok vydání:	2012
Předmět:	Corrosion diffraction spectroscopy fluorescence microstructure microscopy race track x ray thin film sputtering polarisation Engineering (General). Civil engineering (General) TA1-2040
Zdroj:	Ingeniería e Investigación, Vol 32, Iss 3, Pp 10-13 (2012)
Druh dokumentu:	article
ISSN:	0120-5609 2248-8723
Popis:	NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and laser scanning microscopy. Chemical composition was ascertained by X-ray fluorescence (XRF) technique. The results showed that deposition rates increased with higher Si content. A microstructural change was observed for greater than 5% Si content through the transition from a crystalline to an amorphous structure in the thin films. Corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance.
Databáze:	Directory of Open Access Journals
Externí odkaz:	https://doaj.org/article/b9dff15da2634242a6060d58ddca06f7 Zobrazit plný text záznamu View record in DOAJ