EPITAXIAL FILMS OF ZINC SELENIDE ON POROUS SILICON

Autor: V. I. Levchenko, L. I. Postnova, E. L. Trukhanava, V. P. Bondarenko
Jazyk: ruština
Rok vydání: 2019
Předmět:
Zdroj: Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 0, Iss 6, Pp 100-102 (2019)
Druh dokumentu: article
ISSN: 1729-7648
Popis: ZnSe epitaxial films are grown on (111)- and (100)-oriented Si substrates with a porous buffer layer by the thermal evaporation of ZnSe compound. The crystal structure of the deposited films was controlled by X-ray diffraction. The morphology of the films was studied by high-resolution scanning electron microscopy. It was demonstrated the porous buffer layer provides improving the quality of the films compared with films deposited on the monolithic silicon.
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