Effect of Annealing and Thickness of Co40Fe40Yb20 Thin Films on Various Physical Properties on a Glass Substrate

Autor: Wen-Jen Liu, Yung-Huang Chang, Chia-Chin Chiang, Chi-Lon Fern, Yuan-Tsung Chen, Ying-Hsuan Chen, Hao-Wen Liao, Te-Ho Wu, Shih-Hung Lin, Ko-Wei Lin, Po-Wei Chi
Jazyk: angličtina
Rok vydání: 2022
Předmět:
Zdroj: Materials, Vol 15, Iss 23, p 8509 (2022)
Druh dokumentu: article
ISSN: 1996-1944
DOI: 10.3390/ma15238509
Popis: The aim of this work is to investigate the effect of annealing and thickness on various physical properties in Co40Fe40Yb20 thin films. X-ray diffraction (XRD) was used to determine the amorphous structure of Co40Fe40Yb20 films. The maximum surface energy of 40 nm thin films at 300 °C is 34.54 mJ/mm2. The transmittance and resistivity decreased significantly as annealing temperatures and thickness increased. At all conditions, the 10 nm film had the highest hardness. The average hardness decreased as thickness increased, as predicted by the Hall–Petch effect. The highest low-frequency alternative-current magnetic susceptibility (χac) value was discovered when the film was annealed at 200 °C with 50 nm, and the optimal resonance frequency (ƒres) was in the low frequency range, indicating that the film has good applicability in the low frequency range. At annealed 200 °C and 50 nm, the maximum saturation magnetization (Ms) was discovered. Thermal disturbance caused the Ms to decrease when the temperature was raised to 300 °C. The optimum process conditions determined in this study are 200 °C and 50 nm, with the highest Ms, χac, strong adhesion, and low resistivity, which are suitable for magnetic applications, based on magnetic properties and surface energy.
Databáze: Directory of Open Access Journals
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