| Autor: |
Asisa Kumar Panigrahy, Veera Venkata Sai Amudalapalli, Depuru Shobha Rani, Muralidhar Nayak Bhukya, Hima Bindu Valiveti, Vakkalakula Bharath Sreenivasulu, Raghunandan Swain |
| Jazyk: |
angličtina |
| Rok vydání: |
2024 |
| Předmět: |
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| Zdroj: |
IEEE Access, Vol 12, Pp 73160-73168 (2024) |
| Druh dokumentu: |
article |
| ISSN: |
2169-3536 |
| DOI: |
10.1109/ACCESS.2024.3392621 |
| Popis: |
This work investigates the effect of single and dual-k spacer materials consisting of different dielectric constants (k) in optimized nano-channel gate-stack nanosheet (NS-FET) employing hafnium oxide and silicon dioxide as gate insulator to improve its sub-threshold performance. The effect of the external low-k spacer modification in the dual-k spacer has been shown by adjusting the inner high-k spacer. The drain-induced barrier lowering (DIBL) in this modification with dual-k spacer is 14 mV/V, a significant improvement above single spacer NS-FET. The Visual TCAD 3D Cogenda tool is used to examine the performance of the developed NS-FET with air, single, dual-k, and hybrid spacers. The CADENCE platform is used to perform circuit aspects. Additionally, a comparison of the device architecture’s performance study with respect to DC characteristics is made. DC parameters of the proposed device are established: $I_{ON}$ to $I_{OFF}$ ratio of approximately $10^{5}$ , DIBL of approximately 14 mV/V, sub-threshold swing (SS) of approximately 62 mV/dec, and low threshold voltage (Vth) of 0.38 V. The analysis on power consumption for advanced NS-FET is also analyzed with single-k and dual-k spacers. The performance of single-k and dual-k spacer dielectric variation for CMOS inverter is also shown. Furthermore, low power consumption by this NS-FET ensures improved device performance suitable for nanoscale semiconductor industries. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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