Engineering ferroelectric tunnel junctions through potential profile shaping

Autor: S. Boyn, V. Garcia, S. Fusil, C. Carrétéro, K. Garcia, S. Xavier, S. Collin, C. Deranlot, M. Bibes, A. Barthélémy
Jazyk: angličtina
Rok vydání: 2015
Předmět:
Zdroj: APL Materials, Vol 3, Iss 6, Pp 061101-061101-6 (2015)
Druh dokumentu: article
ISSN: 2166-532X
DOI: 10.1063/1.4922769
Popis: We explore the influence of the top electrode materials (W, Co, Ni, Ir) on the electronic band profile in ferroelectric tunnel junctions based on super-tetragonal BiFeO3. Large variations of the transport properties are observed at room temperature. In particular, the analysis of current vs. voltage curves by a direct tunneling model indicates that the metal/ferroelectric interfacial barrier height increases with the top-electrode work function. While larger metal work functions result in larger OFF/ON ratios, they also produce a large internal electric field which results in large and potentially destructive switching voltages.
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