Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method

Autor:	M. I. B. Bernardi, E. J. H. Lee, P. N. Lisboa-Filho, E. R. Leite, E. Longo, A. G. Souza
Jazyk:	English<br />Portuguese
Rok vydání:	2002
Předmět:	organometallic compounds thin films Engineering (General). Civil engineering (General) TA1-2040
Zdroj:	Cerâmica, Vol 48, Iss 305, Pp 38-42 (2002)
Druh dokumentu:	article
ISSN:	1678-4553 0366-6913
DOI:	10.1590/S0366-69132002000100009
Popis:	The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.
Databáze:	Directory of Open Access Journals
Externí odkaz:	https://doaj.org/article/993ce77714294e6db67e8402b9e36f79 Zobrazit plný text záznamu View record in DOAJ