Autor: |
Jee-Hun Jeong, Ogyun Seok, Ho-Jun Lee |
Jazyk: |
angličtina |
Rok vydání: |
2021 |
Předmět: |
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Zdroj: |
Applied Sciences, Vol 11, Iss 24, p 12075 (2021) |
Druh dokumentu: |
article |
ISSN: |
2076-3417 |
DOI: |
10.3390/app112412075 |
Popis: |
A new analytical model to analyze and optimize the electrical characteristics of 4H-SiC trench-gate metal-oxide-semiconductor field-effect transistors (TMOSFETs) with a grounded bottom protection p-well (BPW) was proposed. The optimal BPW doping concentration (NBPW) was extracted by analytical modeling and a numerical technology computer-aided design (TCAD) simulation, in order to analyze the breakdown mechanisms for SiC TMOSFETs using BPW, while considering the electric field distribution at the edge of the trench gate. Our results showed that the optimal NBPW obtained by analytical modeling was almost identical to the simulation results. In addition, the reverse transfer capacitance (Cgd) values obtained from the analytical model correspond with the results of the TCAD simulation by approximately 86%; therefore, this model can predict the switching characteristics of the effect BPW regions. |
Databáze: |
Directory of Open Access Journals |
Externí odkaz: |
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