The Effect of Electrical Parameters of Mather Type Plasma Focus Devices on Energy of the Hard X-Ray Yield
| Autor: | M. A Tafreshi, D Rostamifard, A Nasiri, T D. Mahabadi |
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| Jazyk: | perština |
| Rok vydání: | 2016 |
| Předmět: | |
| Zdroj: | مجله علوم و فنون هستهای, Vol 37, Iss 3, Pp 41-48 (2016) |
| Druh dokumentu: | article |
| ISSN: | 1735-1871 2676-5861 |
| Popis: | In this paper, after reviewing the history of plasma focus devices, the plasma focusing issue is raised and then the results of comparisons between two new Mather type plasma focus devices are presented. The main aim of this investigation was to study the effect of the energy bank capacitance , and the circuit inductance , on the energy of the hard X-ray of Mather type devices. This invetigation showed that the effect of the reduction, on the increment of the hard X-ray energy, is much more than the effect of the discharge energy variation. That is, in spite of 55% discharge energy decrement, a 40% reduction of the , leads to 227% increment of the hard X-ray energy. That is observed in a Mather type device designing. It should be mentioned that the more energy consumption is not a neccesary condition for a more energetic hard X-ray emission. |
| Databáze: | Directory of Open Access Journals |
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