Silicon Nitride Based Non-Volatile Memory Structures with Embedded Si or Ge Nanocrystals

Autor: Zsolt J. Horvath, P. Basa, T. Jaszi, A. E. Pap, Gy. Molnar, A. I. Kovalev, D. L. Wainstein, T. Gerlai, P. Turmezei
Jazyk: angličtina
Rok vydání: 2010
Předmět:
Zdroj: Communications, Vol 12, Iss 2, Pp 19-22 (2010)
Druh dokumentu: article
ISSN: 1335-4205
2585-7878
DOI: 10.26552/com.C.2010.2.19-22
Popis: Memory structures with an embedded sheet of separated Si or Ge nanocrystals were prepared by low pressure chemical vapour deposition using a Si3N4 control and SiO2 tunnel layers. It was obtained that a properly located layer of semiconductor nanocrystals can improve both the charging and retention behaviour of the MNOS structures simultaneously. Memory window width of above 6 V and retention time of 272 years was achieved for charging pulses of 15 V, 10 ms.
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