Pembentukan Titanium Nitrida (TiN) dengan Proses Nitriding pada Titanium Murni Menggunakan Plasma Densitas Tinggi

Autor:	Josephine Maria Windajanti, Dionysius Joseph Djoko Herry Santjojo, Abdurrouf Abdurrouf
Jazyk:	English<br />Indonesian
Rok vydání:	2017
Předmět:	Titanium Murni Sistem Plasma RF-DC Nitriding Temperatur Rendah Kekerasan Permukaan Titanium Nitride Mechanical engineering and machinery TJ1-1570
Zdroj:	Rekayasa Mesin, Vol 8, Iss 2, Pp 83-90 (2017)
Druh dokumentu:	article
ISSN:	2338-1663 2477-6041
DOI:	10.21776/ub.jrm.2017.008.02.5
Popis:	Pure titanium has been widely utilized in industry but its products suffered from low wear and erosion resistance. The plasma nitriding was selected as a tool to harden the pure titanium products but typically high temperature processing was required to attain high hardness. In the present study, high density plasma nitriding system was applied to make low temperature plasma nitriding at 723 K (or 450°C) for 14.4 ks (or 4 hours). The average measured hardness reached to 624 HV. This high hardness of plasma-nitrided pure titanium at low temperature was attributed to formation of fine TiN precipitates and nitrogen solid solution into vacancy sites in the HCP crystalline structure of titanium.
Databáze:	Directory of Open Access Journals
Externí odkaz:	https://doaj.org/article/903c6161f0404987a53a1a23724a4671 Zobrazit plný text záznamu View record in DOAJ