| Autor: |
Kabouraki Elmina, Melissinaki Vasileia, Yadav Amit, Melninkaitis Andrius, Tourlouki Konstantina, Tachtsidis Theodoros, Kehagias Nikolaos, Barmparis Georgios D., Papazoglou Dimitris G., Rafailov Edik, Farsari Maria |
| Jazyk: |
angličtina |
| Rok vydání: |
2021 |
| Předmět: |
|
| Zdroj: |
Nanophotonics, Vol 10, Iss 14, Pp 3759-3768 (2021) |
| Druh dokumentu: |
article |
| ISSN: |
2192-8614 |
| DOI: |
10.1515/nanoph-2021-0263 |
| Popis: |
Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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