Study of KOH as alkali for enhancing performance of photo-galvanic cell in transparent cylindrical cell design

Autor: Pooran Koli, Dheerata
Jazyk: angličtina
Rok vydání: 2024
Předmět:
Zdroj: Heliyon, Vol 10, Iss 11, Pp e32163- (2024)
Druh dokumentu: article
ISSN: 2405-8440
DOI: 10.1016/j.heliyon.2024.e32163
Popis: Photo-galvanic cells are liquid electrolyte-based dye-sensitized solar cells. Chemically, the dye/pigment photo-sensitizer, reductant, surfactant, and alkali materials are the main fabrication components of these cells. Most dye/pigment materials are more soluble and stable at high pH. The pH of Potassium hydroxide (an alkali of plant nutrient ‘potassium’ element) is very high. Therefore, Potassium hydroxide is supposed to be the best eco-friendly and effective alkali medium for photogalvanics. As far as alkali is concerned, NaOH has been exploited extensively in photo-galvanics. Although, the NaOH-based photo-galvanics show good electrical output, it is plagued with some drawbacks like shorter shelf life, high cost, unsafe for skin, low conductivity, low water solubility, etc. Therefore, in the present research, the KOH has been exploited as an alkali material for harvesting solar energy using the Sunset Yellow FCF dye sensitizer-Ascorbic acid reductant-CTAB surfactant cylindrical cell designed photo-galvanic system.In the present study, the observed optimum cell performance is as follows-open-circuit potential 777 mV, maximum current 25000 μA, short-circuit current 5600 μA, power 733.6 μW, fill factor 0.16, and efficiency is 19.77 % at pH 14.30. The Sunset Yellow FCF dye shows very high photostability and photo-absorption with KOH alkali. The power storage capacity is sufficiently robust, as the cell is capable of supplying power at its ∼36.16 % capacity after a very long time of 24 h. The KOH-Sunset Yellow FCF dye sensitizer-Ascorbic acid reductant-CTAB surfactant photo-galvanics in the present study show improved results over the reported results for the NaOH-Sunset Yellow FCF dye sensitizer-Ascorbic acid reductant-CTAB surfactant photo-galvanics. The reasons for the good photo-galvanics with KOH alkali may be attributed to some peculiar chemical and physical properties of KOH vis-à-vis the chemical and physical properties of NaOH.
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